Silicon Surface Passivation
Develops thermal silicon-dioxide passivation, enabling stable semiconductor surfaces for later MOS electronics.
Follow Mohamed Atalla through 2 dated historical records for United States of America.
A chronological timeline drawn from matching World History Database records.
Develops thermal silicon-dioxide passivation, enabling stable semiconductor surfaces for later MOS electronics.
With Dawon Kahng, demonstrates the metal-oxide-semiconductor field-effect transistor for controlling electron flow.
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